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Tech Valley News
SEMATECH Acquires Advanced Etch Tool
SEMATECH, in partnership with the College of Nanoscale Science and Engineering of the University at Albany, is pleased to announce that it has received a 300 mm Telius SP UD system from Tokyo Electron Limited.
The Telius SP UD system is the latest generation through-silicon-via (TSV) etch tool that has the versatility to investigate various chemistries to etch vias ranging from sub 1 micron to tens of microns wide. The TSV RIE tool, which is a critical component of all 3D TSV integration schemes, will be used in SEMATECH’s 3D R&D Center at CNSE’s Albany NanoTech Complex in Tech Valley.
“TEL was the first associate member of the 3D program and has been a valued partner of the Interconnect division for many years. Given their experience in deep silicon etching, we are very pleased to partner with TEL on this critical aspect of developing 3D interconnects,” said John Warlaumont, SEMATECH’s vice president of Advanced Technology. “Leveraging CNSE’s pilot line to establish a 300 mm 3D R&D center is a unique opportunity. It allows our researchers to address the technical and manufacturability issues of creating 3D interconnects within a state-of-the-art CMOS environment.”
Masayuki Tomoyasu, senior vice president and chief engineer for TEL, added, “The integration of TEL's leading-edge 3D tools with SEMATECH's R&D capabilities and know-how will bring significant benefits to our semiconductor customers by refining our processes for TSV etch development.”
Michael Tittnich, associate vice president for Technical Operations at CNSE, said, “The strategic partnership between the UAlbany NanoCollege and SEMATECH continues to demonstrate global leadership in accelerating cutting-edge nanoelectronics education, research, development and deployment for the benefit of a growing number of worldwide industry partners. This latest acquisition of Tokyo Electron’s next-generation TSV RIE tool expands CNSE’s state-of-the-art 300 mm line, while also illustrating the success of SEMATECH’s 3D R&D program and its growing presence and partnerships at CNSE’s Albany NanoTech Complex.”
Issues which have restricted 3D interconnects from entering high-volume manufacturing encompass the front-end, assembly and packaging, and design and test. In an effort to transcend these barriers, SEMATECH’s 3D program has been working jointly with chipmakers, equipment and materials suppliers, and assembly and packaging service companies from around the world on early development challenges, including cost modeling, technology option narrowing, technology development and benchmarking, while also building industry consensus.
CNSE is the first college in the world dedicated to research, development, education and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience and nanoeconomics.
Its Albany NanoTech complex is the most advanced research enterprise of its kind at any university in the world: a $4.5 billion, 450,000-square-foot complex that attracts corporate partners from around the world and offers students a one-of-a-kind academic experience.
CNSE houses the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 65,000 square feet of Class 1 capable cleanrooms. More than 2,000 scientists, researchers, engineers, students, and faculty work on site at CNSE's Albany NanoTech complex, from companies including IBM, AMD, SEMATECH, Toshiba, ASML, Applied Materials, Tokyo Electron, Vistec Lithography and Freescale.
An expansion currently underway will increase the size of CNSE's Albany NanoTech complex to over 800,000 square feet, including over 80,000 square feet of Class 1 capable cleanroom space, to house over 2,500 scientists, researchers, engineers, students, and faculty by mid-2009.
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